AGNIT GaN wafer and device development
Manufacturing MaterialsGaN wafer and application-specific device development for RF and related semiconductor projects.
View solutionServices & Manufacturing
Wafers, substrates, epitaxy, and process materials. Supplying a material is not a CMOS foundry service and not design IP.
GaN wafer and application-specific device development for RF and related semiconductor projects.
View solution
Compound-semiconductor substrates for suitable RF, photonics, and semiconductor manufacturing flows.
View solutionSilicon-carbide epitaxial wafers for suitable semiconductor fabrication processes.
View solutionCMP materials and associated consumables for semiconductor fabrication processes.
View solutionSilicon wafer product families for semiconductor manufacturing.
View solution
Qnity lists the IC1000 series as hard CMP polishing pads for copper bulk, tungsten, STI and ceria, oxide, and buff.
View solution
SUMCO describes silicon wafers as polished disks sliced from high-purity silicon and used as the starting material for semiconductor devices.
View solutionSoitec lists engineered-substrate platforms including FD-SOI, RF-SOI, Power-SOI, and Photonics-SOI.
View solutionWolfspeed lists conductive n-type silicon carbide substrates and customized SiC epitaxy for power electronics, including 200 mm n-type wafers.
View solutionExplore more
Search across providers and capabilities to discover more solutions for your SoC.