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Explore Semiconductor Technologies

Discover 169 technologies from leading innovators around the world.

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Advanced Packaging
Advanced Packaging

Datacon 8800 CHAMEO Hybrid Bonding

Besi Datacon 8800 CHAMEO is a hybrid-bonding die-attach platform for copper-to-copper and related advanced-package construction.

AI & HPCData CenterConsumer ElectronicsView Technology
Design & IP
Design & IP

NXP S32 Automotive Platform

S32 is NXP’s automotive processing platform: common architecture across vehicle network processors, zonal and real-time controllers, radar and central compute. Official pages emphasize Arm Cortex-A/R/M mix, ASIL D safety, hardware security and TSN Ethernet.

AutomotiveIndustrialView Technology
Manufacturing Equipment
Manufacturing Equipment

ASM Epitaxy

ASM epitaxy is a crystalline film-growth equipment platform covering silicon and silicon-germanium transistor epitaxy and silicon carbide epitaxy. Distinct from ASM atomic layer deposition.

AutomotiveAI & HPCEnergyView Technology
Manufacturing Equipment
Manufacturing Equipment

ASML TWINSCAN DUV Lithography

ASML TWINSCAN DUV is the deep-ultraviolet lithography platform covering immersion and dry scanners that print most chip layers alongside EUV. Distinct from NXE and High-NA EXE EUV.

AI & HPCConsumer ElectronicsView Technology
Manufacturing Equipment
Manufacturing Equipment

ASML TWINSCAN NXE EUV Lithography

ASML TWINSCAN NXE is the 0.33 numerical-aperture EUV lithography platform used in high-volume manufacturing of advanced logic and memory chips. Distinct from High-NA EXE systems.

AI & HPCConsumer ElectronicsView Technology
Manufacturing Equipment
Manufacturing Equipment

ASM Atomic Layer Deposition (ALD)

ASM Atomic Layer Deposition technology enables highly controlled, layer-by-layer deposition of ultrathin conformal films for advanced semiconductor logic, memory and packaging structures.

AI & HPCData CenterConsumer ElectronicsView Technology
Manufacturing Equipment
Manufacturing Equipment

ASML TWINSCAN EXE High-NA EUV

ASML High-NA EUV lithography platform (TWINSCAN EXE) using 0.55 numerical aperture optics. Distinct from 0.33 NA TWINSCAN NXE EUV systems.

AI & HPCConsumer ElectronicsView Technology
Silicon Showcase
CompaniesApplicationsTechnology AreasAbout
Submit Technology
Submit Technology
Silicon Showcase

Silicon Showcase™ is the global directory of semiconductor technologies, platforms and innovations from around the world.

  • Technologies
  • Technology Signals
  • Companies
  • Applications
  • Technology Areas
  • About Us
  • How It Works
  • Submit Technology
  • Contact Us
  • Privacy Policy
  • Terms of Use
  • Disclaimer

Explore

  • Technologies
  • Technology Signals
  • Companies
  • Applications
  • Technology Areas

About

  • About Us
  • How It Works
  • Submit Technology
  • Contact Us

Legal

  • Privacy Policy
  • Terms of Use
  • Disclaimer

© 2026 Silicon Showcase™. All rights reserved.

Explore. Compare. Innovate.