HIGH-NA
High-NA (0.55) EUV lithography platform (TWINSCAN EXE)
High-NA (0.55) EUV lithography platform (TWINSCAN EXE)
Described for advanced logic and memory manufacturing
AI & HPC · Consumer Electronics
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ASML TWINSCAN EXE systems are the company’s High-NA EUV lithography platform.
Official technology image
ASML High-NA EUV lithography platform (TWINSCAN EXE) using 0.55 numerical aperture optics. Distinct from 0.33 NA TWINSCAN NXE EUV systems.
Official product pages describe EXE tools as 0.55 numerical-aperture EUV scanners that use a 13.5 nm light source and anamorphic optics. Named models such as TWINSCAN EXE:5000 and TWINSCAN EXE:5200B are scanner SKUs of this platform, not separate listings. ASML presents High-NA EUV as a way to print finer features with fewer multi-patterning steps than lower-NA NXE EUV systems. TWINSCAN NXE (0.33 NA) EUV and TWINSCAN DUV are listed separately. Throughput, overlay and node-readiness claims should be taken only from ASML’s current product documentation.
Key characteristics associated with this technology.
High-NA (0.55) EUV lithography platform (TWINSCAN EXE)
Named EXE scanner models remain SKUs of this platform, not separate listings
Described for advanced logic and memory manufacturing
Distinct from 0.33 NA TWINSCAN NXE EUV and from TWINSCAN DUV
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