
SC26
- November 15 – 20, 2026
- Chicago, Illinois, USA
- Organized by SC Conference Series
Public source
SABRE is Lam Research’s publicly named electrochemical deposition family for copper interconnect.
Official product pages describe SABRE ECD as equipment for copper damascene manufacturing, addressing void-free fill, high-aspect-ratio structures and related logic and memory interconnect, including high-bandwidth memory. Named SABRE series remain tool SKUs of this ECD platform rather than separate listings. SABRE is a wet copper-deposition technology, not a synonym for Lam’s broader plasma etch and deposition category, which is listed separately. Process recipes and tool configurations should be confirmed on Lam’s current SABRE pages.
UMC 22ULP/ULL is the foundry’s 22-nanometer ultra-low-power / ultra-low-leakage logic process platform.
View solutionSMIC 28nm HKMG is the foundry’s published 28-nanometer high-k metal-gate logic process, documented in SMIC newsroom coverage.
View solution3D AI Foundry is a publicly named Powerchip foundry ecosystem.
View solutionGaN wafer and application-specific device development for RF and related semiconductor projects.
View solutionEpitaxial deposition equipment for silicon-carbide semiconductor manufacturing.
View solutionASM Atomic Layer Deposition technology enables highly controlled, layer-by-layer deposition of ultrathin conformal films for advanced semiconductor logic, memory and packaging structures.
View solution