NOV152026
Conference
SC26
- November 15 – 20, 2026
- Chicago, Illinois, USA
- Organized by SC Conference Series
Public source
ASML TWINSCAN NXE EUV Lithography
ASML TWINSCAN NXE systems are the company’s 0.33 numerical-aperture extreme ultraviolet lithography platform.
Overview
Official EUV product pages describe NXE tools as 13.5 nm scanners used in high-volume manufacturing of advanced logic and memory, including foundation layers of 7 nm, 5 nm and 3 nm nodes. Named models such as NXE:3800E, NXE:3600D and NXE:3400C are scanner SKUs of this platform, not separate listings. NXE is distinct from TWINSCAN EXE High-NA (0.55 NA) EUV, which is listed separately, and from TWINSCAN DUV systems that print remaining chip layers. Throughput and overlay figures should be taken only from ASML’s current product documentation.
Lifecycle and categories
- Lifecycle stages
- Wafer fabrication
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