
SC26
- November 15 – 20, 2026
- Chicago, Illinois, USA
- Organized by SC Conference Series
Public source
Endura is Applied Materials’ publicly named ultra-high-vacuum metallization platform.
Official product pages describe Endura PVD as a multi-chamber system for depositing ultra-pure films used in front-end metallization, aluminum and copper interconnect, and related packaging metallization. The platform can host multiple process and preclean chambers for integrated sequences under vacuum. Endura is a metallization/PVD equipment platform, not the newer Vistara wafer-manufacturing chassis, which is listed separately. Chamber options, film stacks and performance data should be confirmed with Applied Materials.
UMC 22ULP/ULL is the foundry’s 22-nanometer ultra-low-power / ultra-low-leakage logic process platform.
View solutionSMIC 28nm HKMG is the foundry’s published 28-nanometer high-k metal-gate logic process, documented in SMIC newsroom coverage.
View solution3D AI Foundry is a publicly named Powerchip foundry ecosystem.
View solutionGaN wafer and application-specific device development for RF and related semiconductor projects.
View solutionEpitaxial deposition equipment for silicon-carbide semiconductor manufacturing.
View solutionASM Atomic Layer Deposition technology enables highly controlled, layer-by-layer deposition of ultrathin conformal films for advanced semiconductor logic, memory and packaging structures.
View solution