BATCH ATOMIC-LAYER DEPOSITION
Batch atomic-layer deposition equipment
Batch atomic-layer deposition equipment
Furnace ALD rather than a single-wafer ALD SKU catalog
AI & HPC · Data Center · Consumer Electronics
Public source
Batch ALD is a publicly named Kokusai Electric deposition technology.
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Illustrative representation based on publicly available technical information.
Kokusai Batch ALD combines atomic-layer deposition with multi-wafer batch furnaces for 3D device films.
Official Kokusai business pages describe batch ALD as combining ALD step coverage with batch productivity for deeper, narrower 3D structures. This listing records Batch ALD rather than every Kokusai furnace SKU.
Key characteristics associated with this technology.
Batch atomic-layer deposition equipment
Furnace ALD rather than a single-wafer ALD SKU catalog
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