GALLIUM NITRIDE EPITAXIAL
Gallium nitride epitaxial wafers on silicon, SiC and sapphire substrates
Gallium nitride epitaxial wafers on silicon, SiC and sapphire substrates
GaN RF transistors described as bare-die, matched or unmatched options
Automotive · Telecommunications · Aerospace & Defense
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AGNIT Semiconductors publishes gallium nitride semiconductor technology spanning epitaxial wafers and RF devices.
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AGNIT publishes gallium nitride semiconductor technology spanning epitaxial wafers and RF devices for high-frequency and high-power electronic systems in telecommunications and related strategic applications.
Official pages describe MOCVD-grown GaN wafers on silicon, silicon carbide and sapphire substrates, together with GaN RF transistors offered as bare die, matched or unmatched parts for high-frequency transmit use. AGNIT presents a wafers-to-devices flow for telecommunications, automotive and defence applications, including RF HEMT devices and evaluation boards, rather than as a finished radio system. This independent listing identifies that GaN materials-and-device technology as one family. Wafer specifications, frequency coverage and qualification data should be confirmed on AGNIT's current technology and product pages.
Key characteristics associated with this technology.
Gallium nitride epitaxial wafers on silicon, SiC and sapphire substrates
GaN RF transistors described as bare-die, matched or unmatched options
Wafers-to-devices flow for telecommunications and strategic applications
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